Allied MultiPrep System 15-2000-GI, Operation Manual

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Maintenance 

Platen Base Cleaning and Platen Cleaning/Storage 

 
Vertical run-out of the platen must be kept at a minimum in order to optimize the precision of the 
MultiPrep™ System.  To prevent oxidation from water and polishing suspensions on the platen 
base, it is very important to clean and dry this surface after each use of the machine.  Warm, 
soapy water or a mild solvent is recommended.  Platens should be removed immediately after use 
and kept dry (i.e. between two paper towels).  If oxidation occurs or colloidal silica dries on the 
rim of the platen base, it can be removed using diamond lapping film. 
 
To clean it, run the platen base, without the platen, at 150 
RPM, while running water directly onto the edge.  Place a 
piece of 30 µm diamond lapping film onto the exposed 
rim, and apply pressure against the back of the film with a 
finger, pressing the abrasive against the rim (Figure 29).  
Hold it in place for at least 30 seconds, and then move the 
film to expose another area and repeat the process.  After 
30 seconds, stop the rotation of the platen base and check 
the vertical run-out of the platen as it rests on the platen 
base.  Repeat the cleaning if necessary to achieve minimal 
run-out (less than 5 µm total).  Keep in mind that debris 
from grinding must be cleaned thoroughly, and lint from 
any cloth used to dry the platen base must be wiped away 
so it does not hinder contact between the platen and platen base. 
 

Safe Cleaning Solutions and Methods 

 
The entire exterior of the MultiPrep™ base is coated with an epoxy-based paint.  Although it is 
mainly resistant to solvents, acetone will remove the paint if it is exposed for too long.  Mild, soapy 
water or detergents (such as Formula 409®) are suitable for cleaning most areas of the machine.  
On the MultiPrep™ head, most parts are either stainless steel or anodized aluminum, for corrosion 
resistance.  The micrometer heads and spindles are steel, which corrode when exposed to water 
and not dried immediately.  No oil, grease, or lubricants should be used on the MultiPrep™ head 
vertical spindle, because it will collect dust and debris that will prematurely wear the surface and 
degrade its performance. 
 

Removing Colloidal Silica 

 
Colloidal silica suspensions dry very quickly and are very difficult to clean once they have dried.  A 
solution of Micro Organic Soap (#148-10000) and warm water will successfully clean dried colloidal 
silica from most surfaces.  A soft, mild brush or scrubbing pad may need to be used. 
 

Figure 29