NANOSYSTEM
FABRICATION FACILITY (NFF), HKUST
Version 1.0
Page 6 of 20
surface using different slurry corresponding to different type of polish cloth. To
get a defect-free surface, it normally needs multi-steps from coarse to intermediate
and to fine polish.
The sample needs to be bounded on a 4-inch ceramic holder using wax. Then put
the ceramic holder and the drive adapter together and fix them using adhesive tape.
After fine polishing, the surface roughness can reach the level of ~1nm.
4.2
Safety Warnings
1. If the equipment failure while being used, never try to fix the problem by
yourself. Please contact NFF staffs.
2. In emergency, please push the red emergency button to interrupt the
equipment power, and report to the NFF staffs immediately. DO NOT attempt
to resume the equipment on before the problem is solved.
3. During process, if something going wrong and you are not sure what happens,
please report to NFF module staffs.
4.3
Operation Precautions and Rules
1. Please reserve the time slot on your own, and make sure you use your own
time slot to do the polish process.
2. Please fill all the details of the logbook attached, i.e. date, name, project
number, email, project details, material …
3. Do not operate the equipment unless you are properly trained and approved by
NFF staffs.
4. Do not leave an on-going etching process unattended.
