Cee® Apogee™ Developer Manual
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5.4. Cleaning
For cleaning, it is good practice to use the mildest solvent possible. The machine cabinet may be
cleaned using most organic solvents, acetone, isopropyl alcohol, or N-methylpyrrolidinone
(NMP). Caustic acids or bases should not be used. The spin bowl lid may be cleaned with
isopropyl alcohol, acetone, or water based cleaners.
Keep solvent from getting into the vacuum system. When cleaning the spin bowl, a small
substrate should be on the spin chuck to keep solvent from getting into the vacuum system. Spin
the wafer at approximately 200 RPM, and use solvent in a wash bottle to flush out the spin bowl.
Keep solvent from going down the spin shaft or the spin shaft tube. Shields and seals will protect
the bearings from a small amount of solvent, but they will not be able to handle large doses. Do
not direct the solvent stream down the shaft or tube.
Avoid getting solvent of any kind on the small yellow "Hot Surface" labels. Use only water-based
cleaner on the labels on the rear of the machine. Use only isopropyl or water based cleaner on
the "power on-off", Cee® logo, the yellow "Caution ... Eye Protection", and the "Cee®
model/serial number" labels. The display may be cleaned with glass cleaner, water, or isopropyl
alcohol.