Laurell Technologies
Quick Start WS-650 Series 10/2011 – 10070193.revL
All information contained in this manual is the property of Laurell Technologies Corporation® and is NOT to be edited, reproduced or
distributed without express written permission from a corporate officer.
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NEVER DO THIS !!
For extended use, clean, rinse, then dry your spin processor after each
use, taking care to prevent any chemicals from entering the vacuum
path. Do not fill up or overflow the process chamber or bowl – fluids
must not be permitted to flow under the substrate. If the chuck face
shows signs of chemical residue, remove and clean immediately.
Cleaning the o-ring surface will improve the seal. See Section 4 in
manual “VACUUM CHUCK WET TEST”. Examine and adjust your
process to prevent such occurrences.
Do not at any time force fluids or pressuring gas in the center of the
vacuum chuck. Cleaning the vacuum path in this manner is dangerous
and can cause significant damage to your spin processor.