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Tergeo plasma cleaner operator’s manual
Revision: B3, Year 2020
pressure sensor is integrated, the user should set a flow rate that provides a pressure between
30~300mTorr for plasma processing. Plasma intensity sensor can constantly monitor the emission
intensity of the plasma. Plasma intensity is a unit-less relative measurement providing users with real-
time feedback.
6.3 Immersion/direct cleaning and remote/downstream cleaning
Plasma consists of electrons, ions, neutral atoms, molecules, and reactive neutral radical species. In
immersion plasma cleaning mode, plasma is generated inside the sample chamber. Samples are subject
to chemical reactions with radical species and energetic ion bombardment. Immersion mode plasma
treatment is mainly used for high-speed plasma etching and surface activation.
Figure 2, immersion mode plasma cleaning
If remote plasma source option is purchased, Tergeo series plasma cleaner can also carry out
downstream mode plasma cleaning. In this mode, plasma is generated in a remote plasma source
attached to the sample chamber. Plasma is mostly confined within the remote plasma source. There
is no ion bombardment to the sample in the downstream cleaning mode. Reactive species
generated in the plasma source will diffuse into the downstream sample chamber and carry out
chemical etching to the surface contaminant on the sample surface. Downstream plasma cleaning is
a gentle plasma cleaning method for delicate samples such as optics with a thin antireflective
coating, gate oxide, graphene, DLC (diamond-like-carbon), carbon fiber or TEM carbon grid