Q150T Sample Preparation System
Q150T - Instruction Manual
33
10473 - Issue 5
order to reduce this error the system attempts to detect when the cord is about to
fuse. If detected the coater will assume next pulse will produce 6 nm thus will
apply the pulse if the predicted outcome would be closer to the terminate value.
For a full list of profile parameters see Table 26.
10.
Run the new profile.
The reliability of this process depends on the operation of the FTM. The
stability of the FTM is affected by the quality of the crystal. A crystal will need
to be changed before the end of its maximum life. This can even be before
the FTM status indicates 10% used (see page 51) as the deposited carbon
will increase the thermal errors and can easily flake. These effects will
increase if materials other than carbon are deposited on the crystal.
Figure 5-2.
Typical 12nm Controlled pulse evaporation
Summary of Contents for Q150T S
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