Systèmes de dosage – construction verticale
CVD 1 (s) / CVD 2
Notice d’utilisation
38
Sous réserve de modifications techniques !
Subject to technical modifications!
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TA450-11 / fr/en /01.2017 / PM
7.1.3 CVD1 – option
suction side (Pos. 300)
The basic unit can be fitted with a piping on the suction side as
option. This piping includes a ball valve as stop valve and a
dirt trap.
Fig.11 Option suction side
7.1.4 CVD1 – option
diaphragm pulsation damper (Pos. 200)
The chemical is dosed by means of an oscillating positive dis-
placement pump. A pulsation damper can be integrated in the
pressure pipe for smoothing the pulsating flow of the pump.
Fig.12 Option diaphragm pulsation damper
CAUTION !
Whether a pulsation damper must be installed or not, de-
pends on the design of the overall system and must be
determined from case to case!
Decisive factors are, among others, the pump size, the
pipe geometry (length and diameter), pipe losses, the geo-
detic height to be negotiated and the opening pressure of
injection fittings (which might be present) resulting from
the spring load.
7.1.5 CVD1 – option
piping of the overflow valve (Pos. 400)
The medium can be led back into the piping on the suction
side via a return pipe when the overflow valve opens.
Fig.13 Option piping of the overflow valve
CAUTION !
This option may only be used when a multifunction device
is mounted, or when the backflow of the medium into the
corresponding tank is not hindered by a foot valve or simi-
lar in the suction pipe.
Inobservance of this note may result in damage to the sys-
tem, the pump or adjacent system parts.
