RF POWER SUPPLY and MATCHINGBOX
2. Overview
2
2. Overview
This section describes the features, configuration, and specifications of this product.
2-1. Introduction
This system was designed with the goal of phase adjustment of RF ink spattering, plasma
CVD, etching, and other plasma generation power supplies. This system can change
arbitrarily the phase of output of each power supply for multiple units of RF power supply
running at 13.56 MHz.
2-2. Features
This system can output while changing the phase simultaneously up to a maximum of 4
to 8 channels.
The system can change the oscillation frequency by adopting a oscillation method by
means of DDS.
The system has been miniaturized, made lighter, and made more maintainable.
Summary of Contents for PHS-04N
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