ZEISS
10 Technical Data and Conformity | 10.1 Product Specification
Parameter
Description
Focus
Working distance:
Range from 1 to 50 mm, depending on accelera-
tion voltage
Manual control:
Course and fine control. Sensitivity related to mag-
nification
Automatic focus control
Focus compensation:
Automatic compensation to minimize focus
changes over the entire acceleration voltage and probe current range
Dynamic focus:
For correction of focus on tilted specimens
Focus wobble:
For assistance in aperture alignment, with adjustable
amplitude and speed
Rotation compensation:
Automatic correction of apparent image
rotation with changes in working distance
Stigmator
Type:
Eight pole electromagnetic
Control:
X and Y adjusted by using hardpanel or PC mouse
Apertures
High Resolution configuration:
7 aperture sizes, 7, 10, 15, 20, 30,
60, 120 µm
High Current configuration:
6 aperture sizes, 10, 20, 30, 60, 120,
300 µm
Electromagnetic selection; precise alignment due to retrievable coordi-
nates
Beam shift
Control:
Adjustment with hardpanel or PC mouse. For precise adjust-
ment of image position at high magnifications
Width:
200 µm (±100 µm) at 20 kV and WD = 8.5 mm
Focused Ion Beam Column (Optional)
Parameter
Description
Ion source
Type:
UHV, with gallium liquid metal ion source (Ga-LMIS)
Source life:
3000 hours at 2 µA of emission current
Isolation:
Automatically controlled valve for source isolation
Indicators:
Status information in software to indicate all emitter pa-
rameters
FIB resolution
3 nm at 30 kV
Focused Ion Beam Low kV configuration (optional):
120 nm at 1 kV
330 nm at 500 V
Probe current
1 pA to 100 nA
Magnification
300x to 500,000x
Acceleration volt-
age
Range:
0.5 to 30 kV
Adjustment:
Continuously variable in 10 Volt steps
Instruction Manual ZEISS Crossbeam 350 | en-US | Rev. 3 | 349500-8111-000
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